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Array
(
    [content] => 
    [params] => Array
        (
            [0] => /forum/threads/intel-foundry-is-way-behind-tsmc-but-the-goal-is-2-by-2030.24411/page-3
        )

    [addOns] => Array
        (
            [DL6/MLTP] => 13
            [Hampel/TimeZoneDebug] => 1000070
            [SV/ChangePostDate] => 2010200
            [SemiWiki/Newsletter] => 1000010
            [SemiWiki/WPMenu] => 1000010
            [SemiWiki/XPressExtend] => 1000010
            [ThemeHouse/XLink] => 1000970
            [ThemeHouse/XPress] => 1010570
            [XF] => 2030871
            [XFI] => 1060170
        )

    [wordpress] => /var/www/html
)

Intel Foundry is way behind TSMC, but the goal is #2 by 2030

my_wing said:
Without High NA EUV
Without Dry Photoresist
Without Pattern Sharpening

Only rely on Double / Quad Patterning, we know the story of Intel 14nm++++++
Good luck, we saw that road and that don't seems to work (one is Intel 14nm / 10nm then is the N3B)
Click to expand...
are the number of plus in 14nm correct? I thought there were only 5 plus
 
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