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The 2025 Extreme Ultraviolet Lithography (EUVL) and Source Workshop will be held at MIT Lincoln Laboratory, from June 21-26, 2025. This annual workshop, organized by EUV Litho, Inc., is a unique forum to discuss the challenge and progress of EUVL as it is being implemented in state-of-the-art semiconductor manufacturing. This workshop, co-organized with Lincoln Laboratory, will also focus on emerging new directions, which would enable semiconductor manufacturing to the end of this decade and well into the 2030s. In particular, leading researchers will present on hyper-NA lithography at 13.5 nm and on the various aspects of lithography at wavelengths below 13.5 nm (Blue-X), including sources, optics, optical design, photomasks, and photoresists. Please note that in 2025, annual EUVL and Source workshops are being held together in June 2025. June 21-22 will consist of online short courses, while June 23-26 will be an in-person workshop at Lincoln Laboratory.
Link to (PDF): Blue-X TWG and 2025 EUVL and Source Workshop – Final Agenda
Link to (PDF): 2025 EUVL and Source Workshop – Abstracts
comment: lots to learn about R&D on the EUV state-of-the-art / progress / outlook in the interesting abstracts of keynotes by INTEL (Steven Carson), IBM (Allen Gabor ) and many other contributions by stakeholders in the EUV-eco-system.