Wanna become the double patterning guru at your company? David Abercrombie, DFM Program Manager for Calibre, has written a series of articles detailing the multifaceted impacts of double patterning on advanced node design and verification. For designers struggling to understand the complexity and nuances of double patterning, these articles provide a well-lit roadmap that enables them to not only comprehend how double patterning will change the design process, but also how they can anticipate and mitigate the potentially unwelcome effects, such as lengthy debugging of double patterning errors, or unforeseen influences on timing and performance. A must-read for every designer who needs to understand double patterning design requirements and verification.
<script type="IN/Share" data-counter="right"></script>