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Thread: What's New and Different for EUV Masks?

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    What's New and Different for EUV Masks?

    Tom Faure from GF does a nice overview of the EUV value proposition, challenges, and the GF planned implementation. This is from the eBeam initiative. Tom came to GF from the IBM Semiconductor acquisition and is an expert in this field, absolutely.



    About the eBeam Initiative
    The Initiative provides a forum for educational and promotional activities regarding new design-to-manufacturing approaches that help reduce mask costs for semiconductor devices based on electron beam (eBeam) technologies.

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    The new aspect of EUV illumination is that there is different shadowing across the slit. This cross-slit shadowing variation cannot be corrected by mask OPC alone because it's a 3D effect not represented by 2D shapes; the source illumination shape (weights at different positions) also needs to be changed for source-mask optimization (SMO). This is further aggravated by aberration variations across slit. This means different illuminations at different slit positions, but this can only be carried out by different exposures.

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    When the presenter talks about data challenges (near the end of the presentation), he mentions he doesn't think they will be problems. It was unclear to me what these challenges are. Does anybody understand this part?

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    Quote Originally Posted by paulhylander View Post
    When the presenter talks about data challenges (near the end of the presentation), he mentions he doesn't think they will be problems. It was unclear to me what these challenges are. Does anybody understand this part?
    He is referring to EUV-specific effects: flare, slit corrections, proximity corrections from ebeam scattering in the multilayer, as well as EUV assist features, and the preparation for multi-beam tools.

    Since this is a mask-centered talk, the source optimization has been ignored completely, but SMO is definitely a must, as already mentioned by ASML, IMEC, etc. OPC has always been dependent on illumination angular distribution and it's now known it varies across the slit as well, not only to compensate shadowing but also aberrations.

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