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  • Synopsys, ARM, Samsung, GLOBALFOUNDRIES (Part 2 of 2)

    Dipesh Patel, VP Engineering, ARM Physical IP

    Consumer demand for smart devices, short life cycles (SmartPhone, Tablets, Internet screens)

    Processor speeds: 1GHz to 1.5GHz
    SOC Memory: 600MHz to 1.2 GHz
    How power efficient?
    How is the layout density?

    Standard Cells: multi-channel, multi-vt (4) libraries

    Memory Compilers: single port, multi port, ROM
    7 families to choose from

    28nm libraries nominal VDD of 1.0V

    Processor Optimization Package (POP)
    - Physical IP
    - Reference flow, documentation, guidelines
    - ARM certified benchmarking

    Cortex A9 – 1.3GHz performance now

    Silicon Validated – created Test Chips for GLOBALFOUNDRIES and Samsung at 32nm and 28nm nodes

    Fab Synch – migrate any design from one fab to another one

    Ready to Start – http://designstart.arm.com/



    Andy Potemski – Director of Global Technical Services, Synopsys

    Lynx Design System – About 2 years old, design system of silicon realization tools
    - Off the shelf productivity
    - A core flow for building an ARM Cortex A9
    - Configure Flow with High Performance Libraries and IP
    o Use DesignWare or 3rd party IP
    - Optimize the methodology for design specific needs
    - Optimize the design floor plan in the context of the full chip
    o Quad core A9 floor plan
    o Explore and optimize
    - Optimize performance and power
    o Detailed routing
    o Trend analysis of design metrics like power, area, speed
    - Optimize the design flow turn around time
    o Track execution of all tools
    o Analyze the profile of each tool
    o Identify tool bottlenecks


    Q: The ARM brochure says up to 25% higher performance or 80% less power. Can I get both?
    A: That’s very difficult. It’s really a tradeoff that you have to choose between.

    Q: How will work on 28nm help 20nm, especially in light of litho effects?
    A: We’re collaborating early in the development of 20nm to learn from our Common Platform partners. Double patterning is needed for 20nm. Expect to see a 50% improvement in density going from 28nm to 20nm node. Computational lithography required on 20nm. Another level of litho complexity make architectural exploration a challenge. Trying to minimize the number of double patterning layers required.


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