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Published on 05-20-2012 03:00 PM
In the world of sub-40nm IC design, as feature size decreases with each new process node, it becomes increasingly difficult to migrate a layout to a new process technology. Too many factors impact manufacturability and yield. At each new process node, to make sure that a given layout is manufacturable and yields well, it is subject to rules that grow in number, type and complexity. Manual migration of a layout from one process technology to another is extremely complex and time-consuming. When an
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Layout Migration and DRC Correction at DAC 2012
Daniel Nenni 05-20-2012